Show publications from
2003
"Repeller Field debris mitigation for mass-limited, tin-doped laser-plasma EUV sources"
Kazutoshi Takenoshita, Chiew-Seng Koay, Somsak (Tony) Teerawattanasook, Martin Richardson
International Symposium on EUV Lithography (Antwerp, Belgium) 30 September-3 October
2003
"Temperature dependant changes in YCOB crystals"
Theresa McGovern, Arnaud Zoubir, Martin Richardson
American Chemical Society National Meeting and Exposition (New Orleans, LA) 23-27 March
2003
"The case for tin as an EUV source"
Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Moza Al-Rabban, Etsuo Fujiwara
EUV Source Workshop (Antwerp, Belgium) 29 September
2003
"The repeller field debris mitigation approach for EUV sources"
Kazutoshi Takenoshita, Chiew-Seng Koay, Martin Richardson, I.C.E. Turcu
SPIE Microlithography Symposium (Santa Clara, CA) 23-28 February
2002
"Ablation Rates of Materials Irradiated by Femtosecond Laser Pulses"
Tina Shih, Nikolai Vorobiev, Martin Richardson
Annual Meeting of the Optical Society of America (OSA) (Orlando, FL) October
2002
"As-S-Se chalcogenide glasses for optical applications"
Cedric Lopez, Patrick LiKamWa, Martin Richardson, Arnaud Zoubir, Kathleen Richardson
Annual Meeting of the Optical Society of America (OSA) (Orlando, FL) October
2002
"Characterization of colloidal gold labels for high resolution microscopy"
Theresa McGovern, Ma'an Al-Ani, John Biggerstaff, Mylene Trujillo
National Conference for Undergraduate Research (NCUR) (Madison, WI) May
2002
"Characterization of Colloidal Gold Labels for High Resolution X-ray Microscopy of Biological Specimens"
Theresa McGovern, Ma'an Al-Ani
American Chemical Society National Meeting and Exposition (Orlando, FL)
2002
"Characterization of Colloidal Gold Labels for High Resolution X-ray Microscopy of Biological Specimens"
Theresa McGovern, Ma'an Al-Ani, Martin Richardson
American Chemical Society National Meeting and Exposition (Orlando, FL)
2002
"Development of high brightness laser plasma source for EUV lithography"
I.C.E. Turcu, Harry Rieger, Mike Powers, Christian Keyser, Martin Richardson
SEMATECH Workshop on Sources for EUV Lithography (San Jose, CA) March
2002
"Development of high brightness laser plasma sources for EUV and X-ray lithography"
I.C.E. Turcu, Harry Rieger, Mike Powers, Christian Keyser, Martin Richardson
Annual DARPA Workshop on Advances in X-Ray Lithography (New Orleans, LA) April
2002
"Femtosecond fabrication and analysis of waveguides and gratings in chalcogenide thin films"
Kathleen Richardson, Arnaud Zoubir, Clara Rivero, Cedric Lopez, Lawrence Shah, Martin Richardson
International Symposium on Non-Oxide Glasses and New Optical Glasses (ISNOG) (Pardubice, Czech Republic) September
2002
"High brightness compact light sources in the XUV"
Martin Richardson
International Symposium on Technologies and Applications of Photoelectron Micro-Spectroscopy with Laser-based VUV Sources (Tsukuba, Japan) December
2002
"High brightness laser plasma sources for EUV and X-ray lithography"
I.C.E. Turcu, Harry Rieger, Mike Powers, Christian Keyser, Martin Richardson
SPIE Conference on High Power Laser Ablation (Taos, NM) May
2002
"High Efficiency EUV Radiation Source Generated by Laser-Produced-Plasma"
I.C.E. Turcu, Harry Rieger, J. Morris, Mike Powers, A. Stone, J. Carosella, Martin Richardson, Christian Keyser
International Symposium on EUV Lithography (Dallas, TX) October
2002
"High intensity laser interactions with matter"
Martin Richardson
AFRL/AFOSR Workshop on High Intensity Laser interactions with Matter (Dayton, OH) December
2002
"Investigation of Type II non-critical phase matching in Gd:YCOB"
E. Baleine, Jason Eichenholz, Etsuo Fujiwara, Arnaud Zoubir, David Grojo, Martin Richardson
Annual Meeting of the Optical Society of America (OSA) (Orlando, FL) October
2002
"Laser-plasma interaction physics of the high repetition water droplet-target x-ray point source"
Christian Keyser, Chiew-Seng Koay, Martin Richardson
Annual Meeting of the Optical Society of America (OSA)29 September
2002
"Photo-induced structural changes in glass – a review"
Martin Richardson
International Workshop on Glass and the Photonics Revolution (Bad Soden, Germany) May
2002
"Physics of mass-limited laser-plasma sources for EUVL"
Martin Richardson, Christian Keyser, Chiew-Seng Koay, I.C.E. Turcu
International Symposium on EUV Lithography (Dallas, TX) October